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Air purification performance of semiconducting photocatalytic materials by Nitric Oxide (NOx) Removal

Researcher in charge: C. Trapalis

The method for estimation of the photocatalytic activity of materials through oxidation of NO developed in “Nanofunctional and Nanocomposites Materials Laboratory”, is based on ISO 22197 -1:2007 - Fine ceramics (advanced ceramics, advanced technical ceramics) - Test method for air-purification performance of semiconducting photocatalytic materials. Part 1: Removal of nitric oxide.

The NO gas is adsorbed on the surface of photocatalyst and is oxidized giving NO2 gas and nitrate ions (NO3-). During the experiment procedure, the concentrations of the gases NO, NO2 and NOx are recorded. The concentration of NOx is the sum of NO and NO2 concentrations. The efficiency of the photocatalytic material is determined by the amount of nitrogen oxides (NOx), which is removed from the gas phase and expressed as the difference: NOoxidized – NO2 formed. The photocatalytic activity is determined under application of ultraviolet (UV) or visible (Vis) radiation.

The concentrations of NO, NO2 and NOx gases are recorded on line in real time with NOx analyzer. The adsorption and desorption of NOx (NO) over the photocatalyst is evaluated by monitoring the concentration of the gases in the dark.

Personnel

NameProfessionRoleEmail addressTelephone
Christos TrapalisChemical EngineerResearcher Atrapalis@ims.demokritos.gr210 6503343
Tatianna GiannakopoulouResearch Associatetgia@ims.demokritos.gr210 6503347
Department of Materials Science, N.C.S.R. "Demokritos", 153 10 Aghia Paraskevi, Attiki, phone: +30 210 6503381, fax: +30 210 6519430
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